Prof. Dr. Hans Zappe appointed Editor-in Chief for SPIE journal

Microsystems engineer has been appointed Editor-in-Chief of the SPIE Journal of Micro/Nanolithography, MEMS, and MOEMS.



Together with Harry Levinson, a consultant at HJL Lithography (USA), the two co-Editors-in-Chief will will share editorial duties for the journal, which covers the fields of optical MEMS and advanced lithography.

Hans Zappe has longe been an associate editor of the journal, and will manage the MEMS, MOEMS, and microfabrication publications. Levinson, well known in the lithography community, will handle micro/nanolithography and related metrology technologies.

For details:


Benutzerspezifische Werkzeuge